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R. Mevel, and S. Gallier
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H. Zhang, Y. Gao, and C.K. Law
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Y.R. Zhang, A.C.T. van Duin, and K.H. Luo
P.B.J. Hoefnagels, P. Wei, D.N. Guzman, C. Sun, D. Lohse, and G. Ahlers
